1959: Difference between revisions
From Landmark
Jump to navigationJump to search
m (Protected "1959" ([Edit=Allow only administrators] (indefinite) [Move=Allow only administrators] (indefinite))) |
mNo edit summary |
||
| Line 9: | Line 9: | ||
In 1959 Fairchild developed the Planar process | In 1959 Fairchild developed the Planar process | ||
with a high quality NPN | with a high quality NPN Silicon process | ||
The better quality and lower cost | The better quality and lower cost | ||
| Line 15: | Line 15: | ||
shut out Japan for quite some time | shut out Japan for quite some time | ||
MOSFET transistor | [https://en.m.wikipedia.org/wiki/MOSFET MOSFET transistor] | ||
Metal Oxide Ssemiconductor Field Effect Transistor | Metal Oxide Ssemiconductor Field Effect Transistor | ||
Revision as of 10:13, 2 December 2021
The 50's saw expanding use
of the PNP germanium transistors
Japan produced lower cost transistors
In 1959 Fairchild developed the Planar process
with a high quality NPN Silicon process
The better quality and lower cost
shut out Japan for quite some time
Metal Oxide Ssemiconductor Field Effect Transistor
was an invention that changed the world.
A photo process, allowing integrated circuits
Computer chips
Solid state memory
